Efficient OER Catalyst with Low Ir Volume Density Obtained by Homogeneous Deposition of Iridium Oxide Nanoparticles on Macroporous Antimony‐Doped Tin Oxide Support
نویسندگان
چکیده
منابع مشابه
Low Temperature Atomic Layer Deposition of Tin Oxide
Atomic layer deposition (ALD) of tin oxide (SnOx) films was achieved using a newly synthesized tin precursor and hydrogen peroxide. We obtained highly pure, conductive SnOx films at temperatures as low as 50 C, which was possible because of high chemical reactivity between the new Sn precursor and hydrogen peroxide. The growth per cycle is around 0.18 nm/cycle in the ALDwindow up to 150 C, and ...
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ژورنال
عنوان ژورنال: Advanced Functional Materials
سال: 2019
ISSN: 1616-301X,1616-3028
DOI: 10.1002/adfm.201906670